Proximity y effect近距离效果
stress proximity effect包括应力邻近效应;应力邻近效应
electromagnetic proximity effect电磁邻近效应
Well Proximity Effect井邻近效应;包括井邻近效应;影响
Proximity Effect Correction邻近效应校正
Proximity Effect Index邻近影响指数
Counteracting Proximity Effect抗近距离效应
Optical Proximity Effect光学邻近效应;这被称为光学邻近效应;产生光学邻近效应;光学临近效应
proximity effect zone邻锚效应区
The proximity effect which consists in the lithography process of high energy electron beam to the resist film leads to a much larger area than the designed figures. The resolution of exposure system is reduced.
但是目前广泛使用的聚焦电子束由于加速电压高、电子散射距离长，光刻时高能电子束在对抗蚀剂的刻写过程中存在着邻近效应，使得实际曝光面积远大于设计图形尺寸，影响了曝光分辨率。
As the density of VLSI circuit increases, the proximity effect has been one of the critical issues in optical lithography.
随着超大规模集成电路（VLSI）图形密度的增大，临近效应已成为光学光刻的关键问题之一。
参考来源 - 光学光刻工艺中邻近效应的定量分析 Quantitative Analysis of the Proximity Effect in Optical Lithographic ProcessThe proximity effect which consists in the lithography process of high energy electron beam to the resist film leads to a much larger area than the designed figures. The resolution of exposure system is reduced.
但是目前广泛使用的聚焦电子束由于加速电压高、电子散射距离长，光刻时高能电子束在对抗蚀剂的刻写过程中存在着邻近效应，使得实际曝光面积远大于设计图形尺寸，影响了曝光分辨率。
参考来源 - 纳米定位微位移工作台的控制技术研究